Plasma sources for advanced semiconductor applications
Oscar Versolato; Igor Kaganovich; Kallol Bera; Thorsten Lill; Hyo-Chang Lee; Ronnie Hoekstra; John Sheil; Sang Ki Nam
- Published
- Publisher
- AIP Publishing
- Journal / collection
- Applied Physics Letters
- Research area
- Semiconductors
- Source type
- Journal article
- DOI
- 10.1063/5.0247819
The original publisher provides the full text and its access options.
Cite this source
Oscar Versolato; Igor Kaganovich; Kallol Bera; Thorsten Lill; Hyo-Chang Lee; Ronnie Hoekstra; John Sheil; Sang Ki Nam. Plasma sources for advanced semiconductor applications. Applied Physics Letters. 2024-12-02. https://doi.org/10.1063/5.0247819