(Invited) Selective Wet Etching of Semiconductor Materials by Novel Catalyst-assisted Modes
Kenta Arima; Junhuan Li; Shiika Murase; Kouji Inagaki
- Published
- Publisher
- The Electrochemical Society
- Journal / collection
- ECS Meeting Abstracts
- Research area
- Semiconductors
- Source type
- Journal article
- DOI
- 10.1149/ma2024-02312267mtgabs
The original publisher provides the full text and its access options.
Cite this source
Kenta Arima; Junhuan Li; Shiika Murase; Kouji Inagaki. (Invited) Selective Wet Etching of Semiconductor Materials by Novel Catalyst-assisted Modes. ECS Meeting Abstracts. 2024-11-22. https://doi.org/10.1149/ma2024-02312267mtgabs