P‐17: Development of Vertical Oxide Channel Thin Film Transistor Based on Hard‐Mask Etching
Binbin Tong; Rui Huang; Lizhong Wang; Jinchao Zhang; Tianmin Zhou; Pengfei Gu; Ce Ning; Guangcai Yuan
- Published
- Publisher
- Wiley
- Journal / collection
- SID Symposium Digest of Technical Papers
- Research area
- Semiconductors
- Source type
- Journal article
- DOI
- 10.1002/sdtp.17816
The original publisher provides the full text and its access options.
Cite this source
Binbin Tong; Rui Huang; Lizhong Wang; Jinchao Zhang; Tianmin Zhou; Pengfei Gu; Ce Ning; Guangcai Yuan. P‐17: Development of Vertical Oxide Channel Thin Film Transistor Based on Hard‐Mask Etching. SID Symposium Digest of Technical Papers. 2024-06. https://doi.org/10.1002/sdtp.17816