NIL solutions using computational lithography for semiconductor device manufacturing
Yukio Nakano; Kenji Yamamoto; Sentaro Aihara; Hiromu Kijima; Satoru Jimbo; Humberto Evans; Shingo Ishida; Masayoshi Fujimoto; Shota Takami; Yuichiro Oguchi; Junichi Seki; Toshiya Asano; Osamu Morimoto
- Published
- Publisher
- SPIE
- Journal / collection
- Photomask Japan 2024: XXX Symposium on Photomask and Next-Generation Lithography Mask Technology
- Research area
- Semiconductors
- Source type
- Conference paper
- DOI
- 10.1117/12.3032446
The original publisher provides the full text and its access options.
Cite this source
Yukio Nakano; Kenji Yamamoto; Sentaro Aihara; Hiromu Kijima; Satoru Jimbo; Humberto Evans; Shingo Ishida; Masayoshi Fujimoto; Shota Takami; Yuichiro Oguchi; Junichi Seki; Toshiya Asano; Osamu Morimoto. NIL solutions using computational lithography for semiconductor device manufacturing. Photomask Japan 2024: XXX Symposium on Photomask and Next-Generation Lithography Mask Technology. 2024-08-26. https://doi.org/10.1117/12.3032446