Exceptional dimensional stability of non-ferromagnetic Invar alloy for advanced semiconductor manufacturing equipment
Hiromichi T. Fujii; Shingo Matsumura; Naoki Sakaguchi; Haruyasu Ohno; Kotaro Ona
- Published
- Publisher
- SPIE
- Journal / collection
- International Conference on Extreme Ultraviolet Lithography 2024
- Research area
- Semiconductors
- Source type
- Conference paper
- DOI
- 10.1117/12.3034312
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Cite this source
Hiromichi T. Fujii; Shingo Matsumura; Naoki Sakaguchi; Haruyasu Ohno; Kotaro Ona. Exceptional dimensional stability of non-ferromagnetic Invar alloy for advanced semiconductor manufacturing equipment. International Conference on Extreme Ultraviolet Lithography 2024. 2024-11-12. https://doi.org/10.1117/12.3034312