Ultra-Low Temperature Epitaxy of Ge-Rich Nanosheets on SOI for Reconfigurable Transistor Applications
Enrique Prado-Navarrete; Christoph Wilflingseder; Andreas Salomon; Thomas Fromherz; Masiar Sistani; Andreas Fuchsberger; Lukas Wind; Daniele Nazzari; Walter M. Weber; Johannes Aberl; Moritz Brehm
- Published
- Publisher
- The Electrochemical Society
- Journal / collection
- ECS Meeting Abstracts
- Research area
- Semiconductors
- Source type
- Journal article
- DOI
- 10.1149/ma2024-02322363mtgabs
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Cite this source
Enrique Prado-Navarrete; Christoph Wilflingseder; Andreas Salomon; Thomas Fromherz; Masiar Sistani; Andreas Fuchsberger; Lukas Wind; Daniele Nazzari; Walter M. Weber; Johannes Aberl; Moritz Brehm. Ultra-Low Temperature Epitaxy of Ge-Rich Nanosheets on SOI for Reconfigurable Transistor Applications. ECS Meeting Abstracts. 2024-11-22. https://doi.org/10.1149/ma2024-02322363mtgabs