Amorphous Carbon Monolayer: A van der Waals Interface for High-Performance Metal Oxide Semiconductor Devices
Viswanath G. Akkili; Jongchan Yoon; Kihyun Shin; Sanghyun Jeong; Ji-Yun Moon; Jun-Hui Choi; Seung-Il Kim; Ashish A. Patil; Frederick Aziadzo; Jeongbeen Kim; Suhyeon Kim; Dong-Wook Shin; Jung-Sub Wi; Hoon-Hwe Cho; Joon Sik Park; Eui-Tae Kim; Dong-Eun Kim; Jaeyeong Heo; Graeme Henkelman; Kostya S. Novoselov
- Published
- Publisher
- American Chemical Society (ACS)
- Journal / collection
- ACS Nano
- Research area
- Semiconductors
- Source type
- Journal article
- DOI
- 10.1021/acsnano.4c12780
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Cite this source
Viswanath G. Akkili; Jongchan Yoon; Kihyun Shin; Sanghyun Jeong; Ji-Yun Moon; Jun-Hui Choi; Seung-Il Kim; Ashish A. Patil; Frederick Aziadzo; Jeongbeen Kim; Suhyeon Kim; Dong-Wook Shin; Jung-Sub Wi; Hoon-Hwe Cho; Joon Sik Park; Eui-Tae Kim; Dong-Eun Kim; Jaeyeong Heo; Graeme Henkelman; Kostya S. Novoselov. Amorphous Carbon Monolayer: A van der Waals Interface for High-Performance Metal Oxide Semiconductor Devices. ACS Nano. 2024-12-31. https://doi.org/10.1021/acsnano.4c12780