Improved Thermal Dissipation in a MoS 2 Field-Effect Transistor by Hybrid High- k Dielectric Layers
Jian Huang; Yifan Li; Xiaotong Yu; Zexin Liu; Fanfan Wang; Yue Yue; Rong Zhang; Ruiwen Dai; Kai Yang; Heng Liu; Qingyang Fan; Donghui Hong; Qiang Chen; Zhiqiang Wang; Yuan Gao; Guoqing Xin
- Published
- Publisher
- American Chemical Society (ACS)
- Journal / collection
- ACS Applied Materials & Interfaces
- Research area
- Semiconductors
- Source type
- Journal article
- DOI
- 10.1021/acsami.4c12143
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Cite this source
Jian Huang; Yifan Li; Xiaotong Yu; Zexin Liu; Fanfan Wang; Yue Yue; Rong Zhang; Ruiwen Dai; Kai Yang; Heng Liu; Qingyang Fan; Donghui Hong; Qiang Chen; Zhiqiang Wang; Yuan Gao; Guoqing Xin. Improved Thermal Dissipation in a MoS 2 Field-Effect Transistor by Hybrid High- k Dielectric Layers. ACS Applied Materials & Interfaces. 2024-11-02. https://doi.org/10.1021/acsami.4c12143