Quantitative nanometer-resolution depth profiling of semiconductor implantation profiles using non-matrix-matched microdroplet calibration for LA-ICP-MS
Jakob Willner; Maximilian Podsednik; Michael Nelhiebel; Detlef Günther; Andreas Limbeck
- Published
- Publisher
- Elsevier BV
- Journal / collection
- Microchemical Journal
- Research area
- Semiconductors
- Source type
- Journal article
- DOI
- 10.1016/j.microc.2026.119454
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Cite this source
Jakob Willner; Maximilian Podsednik; Michael Nelhiebel; Detlef Günther; Andreas Limbeck. Quantitative nanometer-resolution depth profiling of semiconductor implantation profiles using non-matrix-matched microdroplet calibration for LA-ICP-MS. Microchemical Journal. 2026-10. https://doi.org/10.1016/j.microc.2026.119454