Detailed analysis of the capacitance characteristic measured using the pseudo-metal–oxide–semiconductor method
Shingo Sato; Yifan Yuan
- Published
- Publisher
- Elsevier BV
- Journal / collection
- Solid-State Electronics
- Research area
- Semiconductors
- Source type
- Journal article
- DOI
- 10.1016/j.sse.2024.108950
The original publisher provides the full text and its access options.
Cite this source
Shingo Sato; Yifan Yuan. Detailed analysis of the capacitance characteristic measured using the pseudo-metal–oxide–semiconductor method. Solid-State Electronics. 2024-07. https://doi.org/10.1016/j.sse.2024.108950