Enabling High-Resolution AFM Analysis of Advanced Semiconductor Devices through Concentrated Argon Ion Beam Milling
C.S. Bonifacio; R. Li; M.L. Ray; P.E. Fischione; J. Holm; J. Killgore; Rosalina Ring
- Published
- Publisher
- ASM International
- Journal / collection
- International Symposium for Testing and Failure Analysis
- Research area
- Semiconductors
- Source type
- Conference paper
- DOI
- 10.31399/asm.cp.istfa2026p0285
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Cite this source
C.S. Bonifacio; R. Li; M.L. Ray; P.E. Fischione; J. Holm; J. Killgore; Rosalina Ring. Enabling High-Resolution AFM Analysis of Advanced Semiconductor Devices through Concentrated Argon Ion Beam Milling. International Symposium for Testing and Failure Analysis. 2026-10-04. https://doi.org/10.31399/asm.cp.istfa2026p0285