Low‐Temperature Poly‐Si Thin‐Film Transistor with High‐k ZrAlO x Gate Insulator with SiO 2 Blocking Layer
Yuna Kim; Byunglib Jung; Md Mobaidul Islam; Byeonggwan Kim; Jin Jang
- Published
- Publisher
- Wiley
- Journal / collection
- Advanced Materials Technologies
- Research area
- Semiconductors
- Source type
- Journal article
- DOI
- 10.1002/admt.202400820
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Cite this source
Yuna Kim; Byunglib Jung; Md Mobaidul Islam; Byeonggwan Kim; Jin Jang. Low‐Temperature Poly‐Si Thin‐Film Transistor with High‐k ZrAlO x Gate Insulator with SiO 2 Blocking Layer. Advanced Materials Technologies. 2024-08-10. https://doi.org/10.1002/admt.202400820