Industrial Monitoring of Residue Deposition in Semiconductor Process Exhaust Pipelines Using Electrical Capacitance Measurements
Minho Jeon; Anil Kumar Khambampati; Jong Hyun Song; Keun Joong Yoon; Kyung Youn Kim
- Published
- Publisher
- Institute of Electrical and Electronics Engineers (IEEE)
- Journal / collection
- IEEE Access
- Research area
- Semiconductors
- Source type
- Journal article
- DOI
- 10.1109/access.2024.3523596
The original publisher provides the full text and its access options.
Cite this source
Minho Jeon; Anil Kumar Khambampati; Jong Hyun Song; Keun Joong Yoon; Kyung Youn Kim. Industrial Monitoring of Residue Deposition in Semiconductor Process Exhaust Pipelines Using Electrical Capacitance Measurements. IEEE Access. 2025. https://doi.org/10.1109/access.2024.3523596