Drastically Suppressing Hydrogen Diffusion in Oxide Thin-Film Transistor Via Nitrogen-Engineered Passivation Layer for Thermal Stability
I. Sak Lee; Jae Won Na; Kyungmoon Kwak; Jong Bin An; Hyun Jae Kim
- Published
- Publisher
- Elsevier BV
- Research area
- Semiconductors
- Source type
- Preprint / posted paper
- DOI
- 10.2139/ssrn.5332539
This is a preprint or other posted paper. Check the original source for its review and publication status.
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Cite this source
I. Sak Lee; Jae Won Na; Kyungmoon Kwak; Jong Bin An; Hyun Jae Kim. Drastically Suppressing Hydrogen Diffusion in Oxide Thin-Film Transistor Via Nitrogen-Engineered Passivation Layer for Thermal Stability. Elsevier BV. 2025. https://doi.org/10.2139/ssrn.5332539