High-current metal ion source for material modification in the semiconductor manufacturing processes
T. Matsumoto; S. Hahto; G. Sacco; H. Kai; R. Wada; T. Kuroi; N. Hamamoto
- Published
- Publisher
- Springer Science and Business Media LLC
- Journal / collection
- MRS Advances
- Research area
- Semiconductors
- Source type
- Journal article
- DOI
- 10.1557/s43580-025-01146-6
The original publisher provides the full text and its access options.
Cite this source
T. Matsumoto; S. Hahto; G. Sacco; H. Kai; R. Wada; T. Kuroi; N. Hamamoto. High-current metal ion source for material modification in the semiconductor manufacturing processes. MRS Advances. 2025-01-30. https://doi.org/10.1557/s43580-025-01146-6