Critical advances in fluorine-plasma-resistant ceramic coatings for semiconductor process chambers: A review
Haoyu Li; Jie Yang; Peng Zhang; Yicheng Wang; Yan Xing
- Published
- Publisher
- Elsevier BV
- Journal / collection
- Surfaces and Interfaces
- Research area
- Semiconductors
- Source type
- Journal article
- DOI
- 10.1016/j.surfin.2026.110535
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Cite this source
Haoyu Li; Jie Yang; Peng Zhang; Yicheng Wang; Yan Xing. Critical advances in fluorine-plasma-resistant ceramic coatings for semiconductor process chambers: A review. Surfaces and Interfaces. 2026-10. https://doi.org/10.1016/j.surfin.2026.110535