Suppressing substrate oxidation during plasma-enhanced atomic layer deposition on semiconductor surfaces
Oliver Bienek; Tim Rieth; Julius Kühne; Benedikt Fuchs; Matthias Kuhl; Laura I. Wagner; Lina M. Todenhagen; Lukas Wolz; Alex Henning; Ian D. Sharp
- Published
- Publisher
- AIP Publishing
- Journal / collection
- Applied Physics Letters
- Research area
- Semiconductors
- Source type
- Journal article
- DOI
- 10.1063/5.0182200
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Cite this source
Oliver Bienek; Tim Rieth; Julius Kühne; Benedikt Fuchs; Matthias Kuhl; Laura I. Wagner; Lina M. Todenhagen; Lukas Wolz; Alex Henning; Ian D. Sharp. Suppressing substrate oxidation during plasma-enhanced atomic layer deposition on semiconductor surfaces. Applied Physics Letters. 2024-02-12. https://doi.org/10.1063/5.0182200