Choice of Metal as Gate Electrode of Thin-Film Transistor With High-k Gate Dielectric
Hao Sun; Yu Heng Deng; Qing He Wang; P. T. Lai
- Published
- Publisher
- Institute of Electrical and Electronics Engineers (IEEE)
- Journal / collection
- IEEE Electron Device Letters
- Research area
- Semiconductors
- Source type
- Journal article
- DOI
- 10.1109/led.2024.3514783
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Cite this source
Hao Sun; Yu Heng Deng; Qing He Wang; P. T. Lai. Choice of Metal as Gate Electrode of Thin-Film Transistor With High-k Gate Dielectric. IEEE Electron Device Letters. 2025-02. https://doi.org/10.1109/led.2024.3514783