Nanocalorimetry for plasma metrology relevant to semiconductor fabrication
J. Trey Diulus; Carles Corbella; Feng Yi; David LaVan; Berc Kalanyan; Mark McLean; Lakshmi Ravi Narayan; William A. Osborn; James E. Maslar; Andrei Kolmakov
- Published
- Publisher
- American Vacuum Society
- Journal / collection
- Journal of Vacuum Science & Technology B
- Research area
- Semiconductors
- Source type
- Journal article
- DOI
- 10.1116/6.0004294
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Cite this source
J. Trey Diulus; Carles Corbella; Feng Yi; David LaVan; Berc Kalanyan; Mark McLean; Lakshmi Ravi Narayan; William A. Osborn; James E. Maslar; Andrei Kolmakov. Nanocalorimetry for plasma metrology relevant to semiconductor fabrication. Journal of Vacuum Science & Technology B. 2025-02-04. https://doi.org/10.1116/6.0004294