Nanoscale-doped dual-channel for improved performance and reliability of Hf: IGTO / a-IGTO thin film transistor
Seungjin Kim; Jin-Hwan Hong; Dongbhin Kim; Byoungdeog Choi
- Published
- Publisher
- Elsevier BV
- Journal / collection
- Materials Science in Semiconductor Processing
- Research area
- Semiconductors
- Source type
- Journal article
- DOI
- 10.1016/j.mssp.2024.108325
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Cite this source
Seungjin Kim; Jin-Hwan Hong; Dongbhin Kim; Byoungdeog Choi. Nanoscale-doped dual-channel for improved performance and reliability of Hf: IGTO / a-IGTO thin film transistor. Materials Science in Semiconductor Processing. 2024-06. https://doi.org/10.1016/j.mssp.2024.108325