Thermal Stress Effects on Quantum Transport in Gate-All-Around Nanosheet Field Effect Transistor in 3D Heterogeneously Integrated Circuits
Yizhang Liu; Wenchao Chen; Shuo Zhang; Liang Tian; Erping Li
- Published
- Publisher
- IEEE
- Journal / collection
- 2024 IEEE International Symposium on Radio-Frequency Integration Technology (RFIT)
- Research area
- Semiconductors
- Source type
- Conference paper
- DOI
- 10.1109/rfit60557.2024.10812567
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Cite this source
Yizhang Liu; Wenchao Chen; Shuo Zhang; Liang Tian; Erping Li. Thermal Stress Effects on Quantum Transport in Gate-All-Around Nanosheet Field Effect Transistor in 3D Heterogeneously Integrated Circuits. 2024 IEEE International Symposium on Radio-Frequency Integration Technology (RFIT). 2024-08-28. https://doi.org/10.1109/rfit60557.2024.10812567