Amorphous TeO2 as P-Type Oxide Semiconductor for BEOL Applications
J Robertson; X Zhang; Q Gui; Y Guo
- Published
- Publisher
- IEEE
- Journal / collection
- 2024 International VLSI Symposium on Technology, Systems and Applications (VLSI TSA)
- Research area
- Semiconductors
- Source type
- Conference paper
- DOI
- 10.1109/vlsitsa60681.2024.10546433
The original publisher provides the full text and its access options.
Cite this source
J Robertson; X Zhang; Q Gui; Y Guo. Amorphous TeO2 as P-Type Oxide Semiconductor for BEOL Applications. 2024 International VLSI Symposium on Technology, Systems and Applications (VLSI TSA). 2024-04-22. https://doi.org/10.1109/vlsitsa60681.2024.10546433