Nanosheet Oxide Semiconductor FETs by Atomic Layer Deposition for 3D LSI Application
Masaharu Kobayashi
- Published
- Publisher
- IEEE
- Journal / collection
- 2024 31st International Workshop on Active-Matrix Flatpanel Displays and Devices (AM-FPD)
- Research area
- Semiconductors
- Source type
- Conference paper
- DOI
- 10.23919/am-fpd61635.2024.10615708
The original publisher provides the full text and its access options.
Cite this source
Masaharu Kobayashi. Nanosheet Oxide Semiconductor FETs by Atomic Layer Deposition for 3D LSI Application. 2024 31st International Workshop on Active-Matrix Flatpanel Displays and Devices (AM-FPD). 2024-07-02. https://doi.org/10.23919/am-fpd61635.2024.10615708