Geometric Variability‐Aware Thermal Characteristics Modeling of Nanoscale Silicon Gate‐All‐around Nanowire Transistor
Xiaoyue Feng; Kun Luo; Guohui Zhan; Lijun Xu; Qinzhi Xu; Zhenhua Wu
- Published
- Publisher
- Wiley
- Journal / collection
- physica status solidi (a)
- Research area
- Semiconductors
- Source type
- Journal article
- DOI
- 10.1002/pssa.202400435
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Cite this source
Xiaoyue Feng; Kun Luo; Guohui Zhan; Lijun Xu; Qinzhi Xu; Zhenhua Wu. Geometric Variability‐Aware Thermal Characteristics Modeling of Nanoscale Silicon Gate‐All‐around Nanowire Transistor. physica status solidi (a). 2024-08-12. https://doi.org/10.1002/pssa.202400435