Photoelectron beam from semiconductor photocathodes leading to new inspection technologies
Tomohiro Nishitani; Yuta Arakawa; Kotaro Niimi; Yohei Otsuka; Daiki Sato; Atsushi Koizumi; Haruka Shikano; Hokuto Iijima; Yoshio Honda; Hiroshi Amano
- Published
- Publisher
- SPIE
- Journal / collection
- Metrology, Inspection, and Process Control XXXVIII
- Research area
- Semiconductors
- Source type
- Conference paper
- DOI
- 10.1117/12.3010730
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Cite this source
Tomohiro Nishitani; Yuta Arakawa; Kotaro Niimi; Yohei Otsuka; Daiki Sato; Atsushi Koizumi; Haruka Shikano; Hokuto Iijima; Yoshio Honda; Hiroshi Amano. Photoelectron beam from semiconductor photocathodes leading to new inspection technologies. Metrology, Inspection, and Process Control XXXVIII. 2024-04-10. https://doi.org/10.1117/12.3010730