Plasma dynamics and future of LPP-EUV source for semiconductor manufacturing II
Hakaru Mizoguchi; Kentaro Toita Tomita; Masaharu Shiratani; Daisuke Nakamura; Yukihiro Yamagata; Takeshi Higashiguchi; Atsushi Sunahara
- Published
- Publisher
- SPIE
- Journal / collection
- Optical and EUV Nanolithography XXXVII
- Research area
- Semiconductors
- Source type
- Conference paper
- DOI
- 10.1117/12.3010018
The original publisher provides the full text and its access options.
Cite this source
Hakaru Mizoguchi; Kentaro Toita Tomita; Masaharu Shiratani; Daisuke Nakamura; Yukihiro Yamagata; Takeshi Higashiguchi; Atsushi Sunahara. Plasma dynamics and future of LPP-EUV source for semiconductor manufacturing II. Optical and EUV Nanolithography XXXVII. 2024-04-10. https://doi.org/10.1117/12.3010018