Enhancing lithography precision: characterizing resist profiles in semiconductor manufacturing with rapid probe microscopy
Lei Feng; Vishal Panchal; Richard Thorogate; James Robinson; John Cossins; Andrew D. L. Humphris; Vidya Vaenkatesan; Jo Finders
- Published
- Publisher
- SPIE
- Journal / collection
- International Conference on Extreme Ultraviolet Lithography 2024
- Research area
- Semiconductors
- Source type
- Conference paper
- DOI
- 10.1117/12.3034551
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Cite this source
Lei Feng; Vishal Panchal; Richard Thorogate; James Robinson; John Cossins; Andrew D. L. Humphris; Vidya Vaenkatesan; Jo Finders. Enhancing lithography precision: characterizing resist profiles in semiconductor manufacturing with rapid probe microscopy. International Conference on Extreme Ultraviolet Lithography 2024. 2024-11-12. https://doi.org/10.1117/12.3034551