Use Damascus CMP to fabricate IGZO transistor in advanced Dram technology
Zeng Ming; Wang Wei; Sun Hongbo; Wang Guilei; Zhao Chao
- Published
- Publisher
- IEEE
- Journal / collection
- 2025 Conference of Science and Technology of Integrated Circuits (CSTIC)
- Research area
- Semiconductors
- Source type
- Conference paper
- DOI
- 10.1109/cstic64481.2025.11017800
The original publisher provides the full text and its access options.
Cite this source
Zeng Ming; Wang Wei; Sun Hongbo; Wang Guilei; Zhao Chao. Use Damascus CMP to fabricate IGZO transistor in advanced Dram technology. 2025 Conference of Science and Technology of Integrated Circuits (CSTIC). 2025-03-24. https://doi.org/10.1109/cstic64481.2025.11017800