Nanoimprint performance improvements for high volume semiconductor device manufacturing
Shinichi Shudo; Hirotoshi Torii; Yoshio Suzaki; Atsuchi Kimura; Kiyohito Yamamoto; Mitsuru Hiura; Keita Sakai; Yukio Takabayashi
- Published
- Publisher
- SPIE
- Journal / collection
- Photomask Japan 2024: XXX Symposium on Photomask and Next-Generation Lithography Mask Technology
- Research area
- Semiconductors
- Source type
- Conference paper
- DOI
- 10.1117/12.3034104
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Cite this source
Shinichi Shudo; Hirotoshi Torii; Yoshio Suzaki; Atsuchi Kimura; Kiyohito Yamamoto; Mitsuru Hiura; Keita Sakai; Yukio Takabayashi. Nanoimprint performance improvements for high volume semiconductor device manufacturing. Photomask Japan 2024: XXX Symposium on Photomask and Next-Generation Lithography Mask Technology. 2024-08-26. https://doi.org/10.1117/12.3034104