Low temperature PECVD processes for the fabrication of integrated symmetrical resonant UV210 organic/semiconductor structures
J. Gastebois; N. Coulon; H. Cormerais; C. Levallois; E. Bêche; J. Esvan; A. Moréac; H. Lhermite; L. Garnier; B. Bêche
- Published
- Publisher
- Elsevier BV
- Journal / collection
- Materials Today Communications
- Research area
- Semiconductors
- Source type
- Journal article
- DOI
- 10.1016/j.mtcomm.2024.109173
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Cite this source
J. Gastebois; N. Coulon; H. Cormerais; C. Levallois; E. Bêche; J. Esvan; A. Moréac; H. Lhermite; L. Garnier; B. Bêche. Low temperature PECVD processes for the fabrication of integrated symmetrical resonant UV210 organic/semiconductor structures. Materials Today Communications. 2024-06. https://doi.org/10.1016/j.mtcomm.2024.109173