Optimizing X-ray Laminography for Planar Semiconductor Devices: A CMOS Camera Sensor Case Study
Till Dreier; Daniel Nilsson; Julius Hållstedt
- Published
- Publisher
- ASM International
- Journal / collection
- International Symposium for Testing and Failure Analysis
- Research area
- Semiconductors
- Source type
- Conference paper
- DOI
- 10.31399/asm.cp.istfa2026p0725
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Cite this source
Till Dreier; Daniel Nilsson; Julius Hållstedt. Optimizing X-ray Laminography for Planar Semiconductor Devices: A CMOS Camera Sensor Case Study. International Symposium for Testing and Failure Analysis. 2026-10-04. https://doi.org/10.31399/asm.cp.istfa2026p0725