Modeling and control of L-type network impedance matching for semiconductor plasma etch
Carlos Rodriguez; Jairo Viola; YangQuan Chen; Joaquin Alvarez
- Published
- Publisher
- American Vacuum Society
- Journal / collection
- Journal of Vacuum Science & Technology B
- Research area
- Semiconductors
- Source type
- Journal article
- DOI
- 10.1116/6.0003444
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Cite this source
Carlos Rodriguez; Jairo Viola; YangQuan Chen; Joaquin Alvarez. Modeling and control of L-type network impedance matching for semiconductor plasma etch. Journal of Vacuum Science & Technology B. 2024-03-01. https://doi.org/10.1116/6.0003444