N-Type Low-Temperature Polycrystalline Silicon and Amorphous Oxide Thin-Film Transistor-Based Robust Dual-Output Gate Driver
Chih-Lung Lin; Chung-Tien Chiu; Li-Wei Shih; Yi-Chien Chen; Chia-Ling Tsai; De-Lin Shih; Po-Cheng Lai
- Published
- Publisher
- Institute of Electrical and Electronics Engineers (IEEE)
- Journal / collection
- IEEE Transactions on Electron Devices
- Research area
- Semiconductors
- Source type
- Journal article
- DOI
- 10.1109/ted.2024.3466838
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Cite this source
Chih-Lung Lin; Chung-Tien Chiu; Li-Wei Shih; Yi-Chien Chen; Chia-Ling Tsai; De-Lin Shih; Po-Cheng Lai. N-Type Low-Temperature Polycrystalline Silicon and Amorphous Oxide Thin-Film Transistor-Based Robust Dual-Output Gate Driver. IEEE Transactions on Electron Devices. 2024-11. https://doi.org/10.1109/ted.2024.3466838