Implementing Remote Doping and Suppressed Scattering in MoS₂ Field-Effect Transistor Using CMOS-Compatible Process
Weiming Ma; Tianjiao Zhang; Jiayang Hu; Yu Kang; Hanxi Li; Jiachao Zhou; Qian He; Hailiang Wang; Yang Xu; Yuda Zhao; Bin Yu
- Published
- Publisher
- Institute of Electrical and Electronics Engineers (IEEE)
- Journal / collection
- IEEE Transactions on Electron Devices
- Research area
- Semiconductors
- Source type
- Journal article
- DOI
- 10.1109/ted.2024.3382673
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Cite this source
Weiming Ma; Tianjiao Zhang; Jiayang Hu; Yu Kang; Hanxi Li; Jiachao Zhou; Qian He; Hailiang Wang; Yang Xu; Yuda Zhao; Bin Yu. Implementing Remote Doping and Suppressed Scattering in MoS₂ Field-Effect Transistor Using CMOS-Compatible Process. IEEE Transactions on Electron Devices. 2024-05. https://doi.org/10.1109/ted.2024.3382673