Metrology and segmentation in SEM/TEM imaging: accelerating semiconductor analysis through advanced deep learning techniques
Isaac Wilfried Sanou; Julien Baderot; Ali Hallal; Léo Mazauric; Vincent Barra; Sergio Martinez; Johann Foucher
- Published
- Publisher
- SPIE
- Journal / collection
- Metrology, Inspection, and Process Control XXXIX
- Research area
- AI & compute
- Source type
- Conference paper
- DOI
- 10.1117/12.3051067
The original publisher provides the full text and its access options.
Cite this source
Isaac Wilfried Sanou; Julien Baderot; Ali Hallal; Léo Mazauric; Vincent Barra; Sergio Martinez; Johann Foucher. Metrology and segmentation in SEM/TEM imaging: accelerating semiconductor analysis through advanced deep learning techniques. Metrology, Inspection, and Process Control XXXIX. 2025-04-24. https://doi.org/10.1117/12.3051067