Interfacial Dipole Engineering for Schottky Barrier Height Lowering Via Crystalline Magnesium Oxide on Semiconductor Surface
Seung Hwan Kim; Yuji Yang; Daeyoon Baek; Seokwoo Jeon; Seung-heon Chris Baek; Hyung-jun Kim
- Published
- Publisher
- Elsevier BV
- Research area
- Semiconductors
- Source type
- Preprint / posted paper
- DOI
- 10.2139/ssrn.5343410
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Cite this source
Seung Hwan Kim; Yuji Yang; Daeyoon Baek; Seokwoo Jeon; Seung-heon Chris Baek; Hyung-jun Kim. Interfacial Dipole Engineering for Schottky Barrier Height Lowering Via Crystalline Magnesium Oxide on Semiconductor Surface. Elsevier BV. 2025. https://doi.org/10.2139/ssrn.5343410