Electrical Response and Ramped-Breakdown Behavior of ALD HfO2/Al2O3 Laminated Dielectrics for Scaled Semiconductor Memory Applications
Ji Won Hwang; Dong Yun Sung; Seul Ki Hong
- Published
- Publisher
- MDPI AG
- Journal / collection
- Electronics
- Research area
- Semiconductors
- Source type
- Journal article
- DOI
- 10.3390/electronics15194530
The original publisher provides the full text and its access options.
Cite this source
Ji Won Hwang; Dong Yun Sung; Seul Ki Hong. Electrical Response and Ramped-Breakdown Behavior of ALD HfO2/Al2O3 Laminated Dielectrics for Scaled Semiconductor Memory Applications. Electronics. 2026-10-03. https://doi.org/10.3390/electronics15194530