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Research literature / Conference paper

Mask management in optimized photolithography scheduling of a high-mix semiconductor manufacturing facility

Renaud ROUSSEL; Camille BABIN; Abdel BITAR; Sebastian KNOPP; Stéphane DAUZERE-PERES; Karim TAMSSAOUET

Published
Publisher
SPIE
Journal / collection
39th European Mask and Lithography Conference (EMLC 2024)
Research area
Semiconductors
Source type
Conference paper
DOI
10.1117/12.3029925

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Renaud ROUSSEL; Camille BABIN; Abdel BITAR; Sebastian KNOPP; Stéphane DAUZERE-PERES; Karim TAMSSAOUET. Mask management in optimized photolithography scheduling of a high-mix semiconductor manufacturing facility. 39th European Mask and Lithography Conference (EMLC 2024). 2024-09-18. https://doi.org/10.1117/12.3029925

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