A DEEP LEARNING APPROACH TO LITHOGRAPHIC HOTSPOT DETECTION IN SEMICONDUCTOR MANUFACTURING
Lily Zhang; Kenneth Wong
- Published
- Publisher
- Upubscience Publisher
- Journal / collection
- Journal of Manufacturing Science and Mechanical Engineering
- Research area
- AI & compute
- Source type
- Journal article
- DOI
- 10.61784/msme3012
The original publisher provides the full text and its access options.
Cite this source
Lily Zhang; Kenneth Wong. A DEEP LEARNING APPROACH TO LITHOGRAPHIC HOTSPOT DETECTION IN SEMICONDUCTOR MANUFACTURING. Journal of Manufacturing Science and Mechanical Engineering. 2024-12-26. https://doi.org/10.61784/msme3012