How Lithography and Metrology Are Enabling Yield in the Next Generation of Semiconductor Patterning
Mark Neisser; Ndubuisi G. Orji; Harry J. Levinson; Umberto Celano; James Moyne; Supika Mashiro; Dan Wilcox; Slava Libman
- Published
- Publisher
- Institute of Electrical and Electronics Engineers (IEEE)
- Journal / collection
- Computer
- Research area
- Semiconductors
- Source type
- Journal article
- DOI
- 10.1109/mc.2023.3312767
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Cite this source
Mark Neisser; Ndubuisi G. Orji; Harry J. Levinson; Umberto Celano; James Moyne; Supika Mashiro; Dan Wilcox; Slava Libman. How Lithography and Metrology Are Enabling Yield in the Next Generation of Semiconductor Patterning. Computer. 2024-01. https://doi.org/10.1109/mc.2023.3312767